原子层沉积增强微纳结构硅电池的光电性能

Enhanced Photovoltaic Performance of Micro-nano Structured Silicon Solar Cells by Atomic Layer Deposition

摘要: 本文用原子层沉积技术在硅表面沉积氧化铝作为钝化层、掺铝氧化锌薄膜作为透明电极，应用于有金字塔结构和黑硅结构的光伏电池上。通过反射光谱、电流-电压曲线、外量子效率等测试，比较平面硅、金字塔绒面硅和黑硅三种不同结构电池的光电性能。通过在金字塔结构表面沉积10个循环氧化铝作为钝化层，180 nm掺铝氧化锌作为透明电极，光电转换效率达到11.23%，短路电流28.72 mA/cm2，开路电压0.548 V，填充因子0.71。相比于没有钝化层和掺铝氧化锌薄膜的样品，电池各方面性能都得到提高。将该钝化层和透明电极应用于黑硅电池上获得了8.89%的光电转换效率。证明掺铝氧化锌作为透明电极、氧化铝作为钝化层，对微纳结构电池性能有明显提高。

Abstract: In this paper, we deposit Al2O3 as a passivation layer and then aluminum doped ZnO (AZO) film as the transparent electrode on silicon solar cells by atomic layer depositon. We compare?the photoelectric properties of different silicon solar cells?(planar, pyramids, and black silicon) by measuring their reflection spectra, I-V curves, and external quantum efficiencies. We deposit 10 cycles of?Al2O3 and 180 nm AZO film on silicon solar cells, and greatly improve their performance in comparison with the case without the passivation layer and AZO film.