Abstract: The variations of thin film qualities under different ES barriers and temperatures are simulated through Kinetic Monte Carlo method taking Cu as a prototype. It comes to the conclusion that in conditions of fixed deposition rate and ES barrier, in certain temperature range, the roughness of thin film would vary dramatically. When multi-layer ES barrier is no less than mono-layer ES barrier, the temperature range is determined by mono-layer ES barrier and the variation of multi-layer ES barrier has little influence to the range. When multi-layer ES barrier is no more than mono-layer ES barrier, multi-layer ES barrier determines the beginning point of the temperature range and mono-layer ES barrier controls the ending point.