Effects of Ehrlich-Schwoebel Barrier on Thin Film Roughness Variation with Temperature
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摘要: 以Cu为原型，利用动力学蒙特卡洛(KMC)方法模拟了在一定的沉积速率下，单层、多层台阶Ehrlich-Schwoebel(ES)势及温度对成膜质量的影响.结果表明，在一定沉积速率和ES势垒下，薄膜的粗糙度在一定范围内随着温度的升高而降低，当多层ES势垒大于单层ES势垒时，此温度范围受单层ES势垒的影响，而与多层ES势垒关系不大；当单层ES势垒大于多层ES势垒时，多层ES势垒与粗糙度下降的起始温度密切相关，单层ES势垒与粗糙度趋于平稳的温度相关.Abstract: The variations of thin film qualities under different ES barriers and temperatures are simulated through Kinetic Monte Carlo method taking Cu as a prototype. It comes to the conclusion that in conditions of fixed deposition rate and ES barrier, in certain temperature range, the roughness of thin film would vary dramatically. When multi-layer ES barrier is no less than mono-layer ES barrier, the temperature range is determined by mono-layer ES barrier and the variation of multi-layer ES barrier has little influence to the range. When multi-layer ES barrier is no more than mono-layer ES barrier, multi-layer ES barrier determines the beginning point of the temperature range and mono-layer ES barrier controls the ending point.
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